An edition of Emerging lithographic technologies IV (2000)

Emerging lithographic technologies IV

28 February-1 March, 2000, Santa Clara, USA

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Cover of: Emerging lithographic technologies IV by Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
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Last edited by ImportBot
July 8, 2023 | History
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An edition of Emerging lithographic technologies IV (2000)

Emerging lithographic technologies IV

28 February-1 March, 2000, Santa Clara, USA

by

  • 0 Ratings
  • 0 Want to read
  • 0 Currently reading
  • 0 Have read

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Publish Date
Publisher
SPIE
Language
English
Pages
900

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Previews available in: English

Subjects
Electron beam Lithography, X-rays, X-ray lithography, Congresses, Masks (Electronics), Industrial applications, Microlithography, X-rays, industrial applications, Masks (electronics), Lithography, electron beam

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Edition Availability
Cover of: Emerging lithographic technologies IV
Emerging lithographic technologies IV: 28 February-1 March, 2000, Santa Clara, USA
2000, SPIE
in English
Libraries near you: WorldCat

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Book Details

Edition Notes

Includes bibliographical references and index.

Published in
Bellingham, Wash
Series
Proceedings of SPIE,, v. 3997, Proceedings of SPIE--the International Society for Optical Engineering ;, v. 3997.
Genre
Congresses.

Classifications

Dewey Decimal Class
621.3815/31
Library of Congress
TK7874 .E525 2000, TK7874.E525 2000

The Physical Object

Pagination
xv, 900 p. :
Number of pages
900

ID Numbers

Open Library
OL3963473M
ISBN 10
0819436151
LCCN
2001267776
OCLC/WorldCat
44738861
Goodreads
1965343

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History

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July 8, 2023 Edited by ImportBot import existing book
July 31, 2020 Edited by ImportBot import existing book
February 18, 2019 Created by MARC Bot import existing book